{"title":"Analogue design - Notes are not enough","authors":"D. O'Riordan","doi":"10.1049/ESS:20060601","DOIUrl":null,"url":null,"abstract":"Analogue designers need to make greater use of constraints management to avoid making mistakes as they deal with higher-complexity systems. Faced with shrinking feature sizes and increased densities, analogue designers are forced more and more to rely on layout craft and specialised place-and-route techniques to meet design specifications and minimise second-order parasitic effects. Modern design-rule-checking (DRC) rule decks are insufficient by themselves in terms of guaranteeing manufacturability. Traditionally, analogue designers have solved this problem by engaging in some form of design-intent dialogue or communication with the back-end mask designers responsible for layout.","PeriodicalId":132835,"journal":{"name":"Electronic Systems and Software","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electronic Systems and Software","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1049/ESS:20060601","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Analogue designers need to make greater use of constraints management to avoid making mistakes as they deal with higher-complexity systems. Faced with shrinking feature sizes and increased densities, analogue designers are forced more and more to rely on layout craft and specialised place-and-route techniques to meet design specifications and minimise second-order parasitic effects. Modern design-rule-checking (DRC) rule decks are insufficient by themselves in terms of guaranteeing manufacturability. Traditionally, analogue designers have solved this problem by engaging in some form of design-intent dialogue or communication with the back-end mask designers responsible for layout.