Asymmetric issues of FinFET device after hot carrier injection and impact on digital and analog circuits

Chenyue Ma, Hao Wang, Xiufang Zhang, F. He, Yadong He, Xing Zhang, Xinnan Lin
{"title":"Asymmetric issues of FinFET device after hot carrier injection and impact on digital and analog circuits","authors":"Chenyue Ma, Hao Wang, Xiufang Zhang, F. He, Yadong He, Xing Zhang, Xinnan Lin","doi":"10.1109/ISQED.2010.5450542","DOIUrl":null,"url":null,"abstract":"This paper presents the asymmetric issue of FinFET device after hot carrier injection (HCI) effect and impact on the digital and analog circuits. The interface state distribution along the FinFET channel is first extracted from hot carrier injection experimental data, and then develops a compact FinFET model to simulate the impact on asymmetric distribution of interface states to the device characteristics. The results show that the asymmetric degradation is much more significant in Ids-Vds characteristics than in Ids-Vgs characteristics. On the other hand, digital and analogy circuits exhibit different asymmetric performance degradation in various operation cases.","PeriodicalId":369046,"journal":{"name":"2010 11th International Symposium on Quality Electronic Design (ISQED)","volume":"139 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-03-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 11th International Symposium on Quality Electronic Design (ISQED)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISQED.2010.5450542","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

This paper presents the asymmetric issue of FinFET device after hot carrier injection (HCI) effect and impact on the digital and analog circuits. The interface state distribution along the FinFET channel is first extracted from hot carrier injection experimental data, and then develops a compact FinFET model to simulate the impact on asymmetric distribution of interface states to the device characteristics. The results show that the asymmetric degradation is much more significant in Ids-Vds characteristics than in Ids-Vgs characteristics. On the other hand, digital and analogy circuits exhibit different asymmetric performance degradation in various operation cases.
热载流子注入后FinFET器件的不对称问题及其对数字和模拟电路的影响
介绍了热载流子注入(HCI)效应后FinFET器件的不对称问题及其对数字和模拟电路的影响。首先从热载流子注入实验数据中提取出沿FinFET通道的界面态分布,然后建立一个紧凑的FinFET模型来模拟界面态不对称分布对器件特性的影响。结果表明,非对称降解在Ids-Vds特性中比在Ids-Vgs特性中更为显著。另一方面,数字电路和类比电路在不同的运行情况下表现出不同的不对称性能下降。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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