Experimental Study on Void Growth and EM Performance Under Directional Current Reversal

Dingrui Zhang, Weihai Fan, Jizhou Li, Kelly Yang
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Abstract

In this paper, void growth and EM performance under directional current (DC) reversal have been studied by PLR EM. It's found that without DC reversal, void growth mode has one category (void increasing) and statistical void growth rate is positively linearly correlated with MTTF. With DC reversal, void growth mode has three categories (void increasing, void transition, and void refilling) whose proportions have not significant difference with each other (proportions are around 30%), MTTF of void refilling is about one time higher than forward, and overall EM performance with DC reversal shows better than that without DC reversal (MTTF increased by ~16%) for the same cumulative electric resistance shift.
定向电流逆转条件下空穴生长与电磁性能的实验研究
本文利用PLR EM对定向电流(DC)反转下的空穴生长和电磁性能进行了研究,发现在没有DC反转的情况下,空穴生长方式只有一类(空穴增大),统计空穴生长速率与MTTF呈线性正相关。在直流倒转情况下,空穴生长方式有空穴增加、空穴过渡和空穴再填充三种类型,它们的比例没有显著差异(比例在30%左右),空穴再填充的MTTF比正向增大约1倍,在相同的累计电阻位移下,直流倒转的整体电磁性能优于未直流倒转的MTTF (MTTF增加约16%)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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