Drain voltage dependence of on resistance in 700V super junction LDMOS transistor

M. Quddus, L. Tu, T. Ishiguro
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引用次数: 10

Abstract

In this paper, the dependence of the specific on resistance R/sub DS/*A on drain voltage V/sub D/ is presented for the first time for 700 V super junction (SJ) based multi-RESURF LDMOS transistors and such results are compared to those of single-RESURF (SR) and double-RESURF (DR) LDMOS transistors. Based on ISE based 3D device simulation results, it has been demonstrated that even the decrease in the width of the NP stripes of the SJ structure results in significant improvement in R/sub DS/*A. Such improvement suffers greatly at high drain bias V/sub D/ due to an increased influence in the constriction of the current conduction path due to the large depletion effect.
700V超级结LDMOS晶体管漏极电压对电阻的依赖性
本文首次给出了基于700 V超级结(SJ)的多路复用LDMOS晶体管的比电阻R/sub DS/*A对漏极电压V/sub D/的依赖性,并与单路复用(SR)和双路复用(DR) LDMOS晶体管的结果进行了比较。基于ISE的三维器件仿真结果表明,即使减小SJ结构的NP条纹宽度,R/sub DS/*A也会得到显著改善。在高漏极偏置V/sub / D/时,由于大耗尽效应对电流传导路径收缩的影响增加,这种改进受到很大影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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