{"title":"SRAM cell performance analysis beyond 10-nm FinFET technology","authors":"M. Ichihashi, Y. Woo, S. Parihar","doi":"10.1109/VLSI-TSA.2016.7480512","DOIUrl":null,"url":null,"abstract":"This paper describes the performance analysis of SRAM cell capability beyond 10-nm FinFET technology. Through the circuit simulation with a pseudo memory macro, optimized SRAM cell can demonstrate almost the same performance of traditional metal architecture though the read-out delay analysis. Comparing between HD (High-Density) and HC (High-Current) cell, HD cell shows better performance in the large array macro due to the less parasitic resistance and capacitance.","PeriodicalId":441941,"journal":{"name":"2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)","volume":"120 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSI-TSA.2016.7480512","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
This paper describes the performance analysis of SRAM cell capability beyond 10-nm FinFET technology. Through the circuit simulation with a pseudo memory macro, optimized SRAM cell can demonstrate almost the same performance of traditional metal architecture though the read-out delay analysis. Comparing between HD (High-Density) and HC (High-Current) cell, HD cell shows better performance in the large array macro due to the less parasitic resistance and capacitance.