{"title":"An Advanced Fault Detection Method for Post-CMP Brush Scrubbers","authors":"Yohei Hamaguchi, Shin Aoyama, Tetsuya Tayama, Tsuyoshi Miyatake, Hidehiko Kawaguchi","doi":"10.1109/ISSM.2018.8651144","DOIUrl":null,"url":null,"abstract":"We have developed an advanced fault detection method for post-Chemical Mechanical Polisher (CMP) scrubbers to detect actual rotation statuses. We have found out a relationship between rotation statuses and motor torques by theoretical consideration. We have verified the consideration by measuring the motor torques of two types of mass-production brush scrubbers, roller and pencil brush scrubbers. We are quite confident our method is effective to enhance productivity of the scrubbers.","PeriodicalId":262428,"journal":{"name":"2018 International Symposium on Semiconductor Manufacturing (ISSM)","volume":"81 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 International Symposium on Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2018.8651144","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We have developed an advanced fault detection method for post-Chemical Mechanical Polisher (CMP) scrubbers to detect actual rotation statuses. We have found out a relationship between rotation statuses and motor torques by theoretical consideration. We have verified the consideration by measuring the motor torques of two types of mass-production brush scrubbers, roller and pencil brush scrubbers. We are quite confident our method is effective to enhance productivity of the scrubbers.