Implementation of phase shift focus monitor under modified illumination [photolithography]

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) Pub Date : 2001-10-31 DOI:10.1109/IMNC.2001.984033

S. Nakao, Y. Miyamoto, S. Maejima, A. Ueno, S. Yamashita, J. Miyazaki, A. Tokui, K. Tsujita, I. Arimoto

引用次数: 0

Abstract

For the convenience of practical use of phase shift focus monitor (PSFM), imaging characteristics of PSFM are investigated under modified illumination by optical image calculations and printing experiments. Although the mechanism of pattern shift is different from that in conventional high coherent illumination, sufficient sensitivity for precise focus monitoring is predicted by optical image calculation. By experiments, predicted characteristics are observed and similar sensitivity to that in conventional illumination is confirmed.

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改进照明下相移焦点监控的实现[光刻]

为了便于相移焦监视器的实际应用，通过光学图像计算和打印实验，研究了相移焦监视器在修正照度下的成像特性。虽然模式偏移的机理与传统高相干照明不同，但通过光学图像计算预测了足够的灵敏度以实现精确的焦点监测。通过实验，观察到预测的特征，并证实了与传统照明相似的灵敏度。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)

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