Understanding the cause of IV kink in GaAs MESFETs with two-dimensional numerical simulations

M. R. Wilson, I. Zdebel, P. Wennekers, R. Anholt
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引用次数: 9

Abstract

High performance GaAs MESFETs have been observed to exhibit kinks in their IV characteristics, particularly when high drain-source voltages are applied, Such characteristics make the design of circuits with high operating voltages difficult since this type of IV anomaly is typically not modeled by circuit simulators. This work has identified the cause of these kinks through the use of two-dimensional numerical device simulation with impact ionization. These simulations have also identified a potential device solution to IV kink. Furthermore, the results of this simulation work were verified by comparison with fabricated devices.
利用二维数值模拟了解GaAs mesfet中IV扭结的原因
已经观察到高性能GaAs mesfet在其IV特性中表现出弯曲,特别是当施加高漏源电压时,这种特性使得具有高工作电压的电路设计变得困难,因为这种类型的IV异常通常无法由电路模拟器模拟。这项工作已经确定了这些扭结的原因,通过使用二维数值装置模拟与冲击电离。这些模拟也确定了IV扭结的潜在设备解决方案。此外,通过与已制成器件的对比,验证了仿真工作的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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