Spatial analysis of ZnO thin films prepared by vertically aligned MOCVD

Abstract

Zinc Oxide thin films were grown using a homemade metallorganic chemical vapor deposition apparatus with a non-centrosymmetric groove for the substrate. Films grown with relatively constant thickness and varying temperatures were tested using photoluminescence spectrometry, ex-situ spectral reflectance, and ex-situ transmittance measurements at five distinct points. Results are analyzed to evaluate the spatial consistency in thickness and optical characteristics of the ZnO films.