Highly Strained InGaAs Quantum Well with GaAs Strain Compensating Layer on InGaAs Ternary Substrate for 1.3 μm Laser

M. Arai, K. Kinoshita, S. Yoda, Y. Kondo
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引用次数: 1

Abstract

We have developed highly strained InGaAs quantum wells (QWs) with a 1.3 μm-band emission on a low indium content InGaAs ternary substrate using low temperature metal-organic vapor phase epitaxy (MOVPE). The indium content of the substrate is 0.1, and this has the advantage of providing good thermal conductivity and good crystal quality. In this study, we newly introduced a binary GaAs barrier layer for strain compensation. We performed photoluminescence (PL) and transmission electron microscope (TEM) measurements to confirm that the crystal quality had improved. We realized a broad area laser with GaAs strain compensation that achieved low threshold current operation.
1.3 μm激光InGaAs三元衬底高应变InGaAs量子阱与GaAs应变补偿层
利用低温金属-有机气相外延(MOVPE)技术,在低铟含量InGaAs三元衬底上制备了高应变、1.3 μm波段发射的InGaAs量子阱(QWs)。衬底的铟含量为0.1,这具有提供良好的导热性和良好的晶体质量的优点。在这项研究中,我们新引入了一种用于应变补偿的二元砷化镓势垒层。我们进行了光致发光(PL)和透射电子显微镜(TEM)测量,以证实晶体质量有所改善。实现了GaAs应变补偿的广域激光器,实现了低阈值电流工作。
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