XRD study of gas sensitive SnO/sub 2/ thin films deposited by spray pyrolysis method

G. Korotcenkov, J. Schwank, M. DiBattista, V. Brinzari
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引用次数: 1

Abstract

The results ofresearch of SnO2 thin film structure using XRD difhction is presented in this report. We discuss the influence of conditions of film deposition and modes of heat treatment m the range of temperatures 400-900°C on crystallite size and predominant orientation. It was determined that SnOz 5 h s , deposited by spray pyrolysis method, are textured polyaystalline films with nano-size aystal€ites (Hl-20 run). Predominant orientatkm of crystallites ((1 10) or (200)). forming the gas sensitive surface, depends on film thickness and used modes of deposition. We also have shown that the structure of studied Sn02 films was very stable in oxygen atmosphere.
喷雾热解法制备SnO/ sub2气敏薄膜的XRD研究
本文介绍了用XRD衍射法研究SnO2薄膜结构的结果。我们讨论了在400-900℃范围内薄膜沉积条件和热处理方式对晶体尺寸和优势取向的影响。结果表明,喷雾热解法制备的SnOz 5 h是具有纳米级晶胞(Hl-20)的织构多晶膜。主要方向为晶体((110)或(200))。形成气敏表面,取决于薄膜厚度和使用的沉积方式。我们还表明,所研究的sno2薄膜在氧气气氛中结构非常稳定。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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