InP DHBT Characterization up to 500 GHz and Compact Model Validation Towards THz Circuit Design

M. Deng, C. Mukherjee, N. Davy, V. Nodjiadjim, M. Riet, C. Mismer, J. Renaudier, M. D. Matos, C. Maneux
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引用次数: 2

Abstract

We report on-wafer characterization results up to 500 GHz on a 0.4×5 μm2 InP/InGaAs DHBT. The measurements were performed using an on-wafer Thru-Reflect-Line (TRL) calibration kit especially developed in this technology. The resulting measurements allowed to validate both the RF performance of the 0.4-μm InP/InGaAs DHBT fabricated by III-V Lab, featuring 390/600 GHz ${f_{T}f_{{\max}}}$, and the HiCuM compact model towards future circuit design at submillimeter-wave frequencies thanks to 90% typical yield reached in this technology.
InP高达500 GHz的DHBT特性和面向太赫兹电路设计的紧凑模型验证
我们报告了在0.4×5 μm2 InP/InGaAs DHBT上高达500 GHz的晶圆上表征结果。测量是使用该技术专门开发的晶圆上透反射线(TRL)校准套件进行的。测量结果验证了III-V实验室制造的0.4 μm InP/InGaAs DHBT的射频性能,该DHBT具有390/600 GHz ${f_{T}f_{\max}}}$,并且由于该技术达到90%的典型产率,因此可以为未来的亚毫米波频率电路设计提供HiCuM紧凑模型。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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