A new physical I-V model of deep-submicron FD SOI MOSFETs for analogue/digital circuit simulation

X. Xi, Hongmei Wang, Xing Zhang, Yangyuan Wang
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Abstract

A new analytical current model in the strong inversion operation region for fully depleted SOI/MOSFET with channel lengths down to deep submicrometer range is developed with only one single expression for both linear and saturation region without using a smoothing function. The convergence when employed in circuit simulators is improved. Measurements on devices of varied geometry show good agreement with model predictions.
一种新的用于模拟/数字电路仿真的深亚微米FD SOI mosfet物理I-V模型
建立了一种新的分析电流模型,该模型适用于沟道长度低至深亚微米的全耗尽SOI/MOSFET的强反转工作区域,在线性和饱和区域只有一个单一的表达式,而不使用平滑函数。该算法在电路仿真器中的收敛性得到了改善。在不同几何形状的装置上进行的测量结果与模型预测结果吻合良好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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