{"title":"Comparative study of extremely low threshold 1.3/spl mu/m strained and lattice matched quantum well lasers","authors":"A. Mathur, J. Osinski, P. Grodzinski, P. Dapkus","doi":"10.1109/ISLC.1992.763556","DOIUrl":null,"url":null,"abstract":"1.3 /spl mu/m quantum well lasers using compressively strained wells have been fabricated with threshold current density as low as 214 A/cm/sup 2/. A comparison with low threshold lattice matched and tensile strained quantum well lasers is presented.","PeriodicalId":207712,"journal":{"name":"13th IEEE International Semiconductor Laser Conference","volume":"151 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1992-09-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"13th IEEE International Semiconductor Laser Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISLC.1992.763556","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
1.3 /spl mu/m quantum well lasers using compressively strained wells have been fabricated with threshold current density as low as 214 A/cm/sup 2/. A comparison with low threshold lattice matched and tensile strained quantum well lasers is presented.