Use of scalable Parametric Measurement Macro to improve semiconductor technology characterization and product test

Abstract

Use of a Scaling Parametric Macro (SPM) provides more accurate product level environment parametric information than scribe line (Kerf) structures. This paper compares drive current (Ion) data obtained with the SPM macros to scribe line structure Ion measurements. SPM macros provide less variation than scribe line structures. Since SPM is small enough to be included in all products, the SPM macro provides improved Ion product screening