An Mcm-D Foundry from Copper/polyimid Tfml Bare Substrate to Multichif Modules

J.P. Droguet
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Abstract

Description of the process, based on copper conductors and polyimid as a dielectric* (1) Description of the industrial pilot (2) Process characterization (3) Let us briefly remind, as described by fig. 1 hereunder, that the technology allows the realization of a multilayer stack, with up to five levels of conductors for power, ground, two signal layers and a top layer, for components attach and interconnect.
从铜/聚酰亚胺tml裸基板到多模块的Mcm-D铸造
基于铜导体和聚酰亚胺作为介质的工艺描述*(1)工业试验描述(2)工艺表征(3)让我们简要地提醒一下,如下图1所示,该技术允许实现多层堆叠,具有多达五层的导体,用于电源,接地,两层信号层和顶层,用于组件连接和互连。
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