Photo track defect control using multiple masking layer defect data

Abstract

The defect monitoring strategy presented here has been developed for defectivity feedback for track and stepper issues typically seen in a high volume multi-device manufacturing facility. It combines data streams from multiple masking layers and product mixes improving the signal to noise ratio (S/N) of the defectivity signal utilizing an AMD/Spansion developed statistical control system known as ASPECT. True defect driven failures at the current layer, faster feedback loops, and a more comprehensive look at potential problems within the photo lithography area are the results of this integrated monitor process control strategy.