{"title":"CK-MASK semi-manual tool for mask inspection and blowing","authors":"A. Leserri, F. Ferrario, U. Iessi, A. Gusmini","doi":"10.1117/12.2326607","DOIUrl":null,"url":null,"abstract":"Photolithography masks require a periodical inspection and cleaning. The visual inspection is often paired with a mask air blowing to remove eye visible particles. If these steps are run manually they are really critical for mask integrity in terms of contaminations, scratches, fingerprints, pellicle damage... All these potential issues arise during the mask certification process causing mask repelliculization, and, in the worst case, mask scrap with drawbacks linked to production aspects: quality (repetitive defects), cost (mask repels/remake), production lots on hold, non-linear production WIP and non-respect of production commitments. AG8-AGM photolithography engineering team in collaboration with “Gusmini attrezzature industriali” developed a tool called “CK-MASK” able to handle 6” masks and to reduce the risks connected to masks inspection and blowing.","PeriodicalId":287066,"journal":{"name":"European Mask and Lithography Conference","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-09-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"European Mask and Lithography Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2326607","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Photolithography masks require a periodical inspection and cleaning. The visual inspection is often paired with a mask air blowing to remove eye visible particles. If these steps are run manually they are really critical for mask integrity in terms of contaminations, scratches, fingerprints, pellicle damage... All these potential issues arise during the mask certification process causing mask repelliculization, and, in the worst case, mask scrap with drawbacks linked to production aspects: quality (repetitive defects), cost (mask repels/remake), production lots on hold, non-linear production WIP and non-respect of production commitments. AG8-AGM photolithography engineering team in collaboration with “Gusmini attrezzature industriali” developed a tool called “CK-MASK” able to handle 6” masks and to reduce the risks connected to masks inspection and blowing.