CK-MASK semi-manual tool for mask inspection and blowing

A. Leserri, F. Ferrario, U. Iessi, A. Gusmini
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Abstract

Photolithography masks require a periodical inspection and cleaning. The visual inspection is often paired with a mask air blowing to remove eye visible particles. If these steps are run manually they are really critical for mask integrity in terms of contaminations, scratches, fingerprints, pellicle damage... All these potential issues arise during the mask certification process causing mask repelliculization, and, in the worst case, mask scrap with drawbacks linked to production aspects: quality (repetitive defects), cost (mask repels/remake), production lots on hold, non-linear production WIP and non-respect of production commitments. AG8-AGM photolithography engineering team in collaboration with “Gusmini attrezzature industriali” developed a tool called “CK-MASK” able to handle 6” masks and to reduce the risks connected to masks inspection and blowing.
CK-MASK用于口罩检查和吹制的半手动工具
光刻口罩需要定期检查和清洁。目视检查通常与口罩吹气配合使用,以去除肉眼可见的颗粒。如果这些步骤是手动运行的,它们对于口罩的完整性非常关键,包括污染、划痕、指纹、薄膜损坏……所有这些潜在问题都是在口罩认证过程中出现的,导致口罩被排斥,在最坏的情况下,口罩报废与生产方面的缺陷有关:质量(重复缺陷)、成本(口罩排斥/重制)、生产批次暂停、非线性生产在制品和不遵守生产承诺。AG8-AGM光刻工程团队与“Gusmini attrezzature industriali”合作开发了一种名为“CK-MASK”的工具,能够处理6英寸的口罩,并降低了与口罩检查和吹制相关的风险。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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