High-performance nanoscale topological inductor

Abstract

Despite being an important constituent of a variety of RF and voltage regulating circuits, on-chip inductors have failed to scale at the same rapid pace as other components such as capacitors and transistors. This failure is largely due to the bulky spiral geometry that is needed for planar device fabrication, which results in low inductance densities. Ultimately, an alternative design paradigm using new phenomena and materials is necessary to achieve the miniaturization and performance goals for the future of these vital components. Here, we present a novel inductor design that achieves high performance by utilizing the surface states of 3D time-reversal-invariant (TRI) topological insulators (TIs).