S. Tanimoto, Y. Someda, M. Okumura, H. Ohta, Y. Sohda, N. Saito
{"title":"Fundamental study of \"matrix pattern imaging\", EB system","authors":"S. Tanimoto, Y. Someda, M. Okumura, H. Ohta, Y. Sohda, N. Saito","doi":"10.1109/IMNC.2000.872665","DOIUrl":null,"url":null,"abstract":"A new approach of electron beam lithography is proposed for high-throughput exposure systems. In an exposure system using this approach, the electron sources are arranged in a matrix so that they produce an electron beam in the shape of a circuit pattern, which is focused on the target. We call our approach \"matrix pattern imaging (MPI)\". In such a system, the electron sources play a key role, and the MIM (metal-insulator-metal) cathode is a promising candidate for them. We therefore compared its properties to those of other candidates. We also performed simple projection experiments and evaluated the merits of such a system.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"46 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.2000.872665","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
A new approach of electron beam lithography is proposed for high-throughput exposure systems. In an exposure system using this approach, the electron sources are arranged in a matrix so that they produce an electron beam in the shape of a circuit pattern, which is focused on the target. We call our approach "matrix pattern imaging (MPI)". In such a system, the electron sources play a key role, and the MIM (metal-insulator-metal) cathode is a promising candidate for them. We therefore compared its properties to those of other candidates. We also performed simple projection experiments and evaluated the merits of such a system.