A theoretical study of effect of gate voltage on electron-modulated-acoustic-phonon interactions in silicon nanowire MOSFETs

J. Hattori, S. Uno, N. Mori, K. Nakazato
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Abstract

We theoretically investigate the gate voltage dependence of the interaction between modulated acoustic phonons and electrons in SiO2-coated Si nanowires. The gate voltage decreases the form factor calculated with modulated acoustic phonons as well as that for bulk phonons. However, the relative difference between the two form factors, that is, the phonon modulation effect on the form factor becomes larger with increasing gate voltage. In addition, we evaluate the phonon modulation effect on the electron mobility in the Si nanowires, and reveal that the effect becomes smaller with increasing gate voltage.
栅极电压对硅纳米线mosfet中电子调制声声子相互作用影响的理论研究
我们从理论上研究了二氧化硅纳米线中调制声子与电子相互作用的栅极电压依赖性。栅极电压降低了用调制声子计算的形状因子以及体声子的形状因子。然而,两种形式因素之间的相对差异,即声子调制对形式因素的影响随着栅极电压的增加而增大。此外,我们还评估了声子调制对硅纳米线中电子迁移率的影响,发现随着栅极电压的增加,这种影响变小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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