Analysis of evaporation process of thin Ni films by factorial experiments and Taguchi approach

Abstract

Parameters that influence thickness of evaporated Ni thin films were analyzed and their significance calculated. The knowledge of this information is necessary for optimum control of evaporation process. Influence of residual atmosphere pressure in the vacuum bell jar, of the temperature of the substrate and the mass of evaporated metal on the final thickness of the evaporated films were examined. The method of full factorial experiments and the method of Taguchi orthogonal arrays were used for the analysis. The results obtained by both the methods were compared and differences between the results were found. The differences were not significant and were caused by different range of an experimental basis in these methods.