Investigation of the influence of substrate temperature on the thermal resistance and square stability of amorphous titanium-vanadium oxide films

Abstract

Stability of materials is of great technical importance for materials to be applied technologically. In this paper, a novel material-amorphous composite films of titanium and vanadium oxides films, which may have a very promising industrial application, were obtained by reactive dc magnetron co-sputtering deposition. The dependence of thermal resistance and square resistance stability of the samples on the different substrate temperature during the co-sputtering deposition was investigated. Furthermore, analysis of square resistance and its stability of the samples demonstrated that the substrate temperature during the deposition played a very important role on the electrical properties and square resistance stability of the films. The width of the thermal resistance hysteresis loop was also observed to be varied with the substrate temperature.