Non-Graded Base Si/Ge Heterojunction Transistor

Sam Mil'shtein, Harsha Purushothama Dombala, Oliver A Kia, M. Zinaddinov
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Abstract

Innovation of Heterojunction Bipolar Transistor (HBT) technology is a major game changer in wireless communication, power amplifiers and other major fields of electronics. HBTs play a vital role in extending the advantages of silicon bipolar transistors to significantly higher levels. Research on HBT is focused on reducing cost and improving reliability.  These transistors have a wide range of applications namely, digital-to-analog converters, logarithmic amplifiers, RF chip sets for CDMA wireless communication systems, and power amplifiers for cellular communications. Our study focuses on utilizing the high mobility of pure Ge instead of often-used graded Ge base. Non-grtaded Ge base enhanses carrier transport which in turn increases the gain and cut-off frequency of the HBT. We have developed a high frequency, high current gain, high power gain and less noisy heterojunction bipolar transistor operating above 100GHz frequency. Lattice mismatch at emitter and collector junctions is compensated by inserting SiGe buffer layers. ATLAS TCAD - SILVACO software is used for modelling of this novel device.
非梯度基极Si/Ge异质结晶体管
异质结双极晶体管(HBT)技术的创新是无线通信、功率放大器和其他主要电子领域的重大变革。HBTs在将硅双极晶体管的优势扩展到更高水平方面发挥着至关重要的作用。HBT的研究重点是降低成本和提高可靠性。这些晶体管有广泛的应用,即数模转换器、对数放大器、CDMA无线通信系统的射频芯片组和蜂窝通信的功率放大器。我们的研究重点是利用纯锗的高迁移率来代替常用的梯度锗基。非梯度Ge基增强了载流子输运,从而增加了HBT的增益和截止频率。我们研制了一种工作频率在100GHz以上的高频、高电流增益、高功率增益、低噪声的异质结双极晶体管。通过插入SiGe缓冲层来补偿发射极和集电极结处的晶格失配。ATLAS TCAD - SILVACO软件用于这种新型装置的建模。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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