{"title":"Handsheet for full-custom circuit design","authors":"Natalia A. Fernandez-Garcia, V. Brea, D. Cabello","doi":"10.1109/ICM.2009.5418678","DOIUrl":null,"url":null,"abstract":"This paper addresses a transistor level design for manufacturing methodology. Design efforts are devoted to robustness against process variations. Temperature and voltage tolerances should also be tackled for mass production. A structured design methodology contemplating issues like intuitive design and Monte-Carlo simulations is proposed. As an illustrative example, the methodology is applied to the design of a cellular nonlinear network cell in UMC 130 nm CMOS technology.","PeriodicalId":391668,"journal":{"name":"2009 International Conference on Microelectronics - ICM","volume":"140 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 International Conference on Microelectronics - ICM","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICM.2009.5418678","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This paper addresses a transistor level design for manufacturing methodology. Design efforts are devoted to robustness against process variations. Temperature and voltage tolerances should also be tackled for mass production. A structured design methodology contemplating issues like intuitive design and Monte-Carlo simulations is proposed. As an illustrative example, the methodology is applied to the design of a cellular nonlinear network cell in UMC 130 nm CMOS technology.