Synthesis and Characterization of Novel TMD: Rhenium Disulfide

Michael D. Valentin, Alison Guan, A. Nguyen, I. Lu, Cindy S. Merida, Michael J. Gomez, M. Dubey, L. Bartels
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Abstract

Transition metal dichalcogenides (TMDs) are exciting new materials that have received much attention due to their semiconducting properties in the direct bandgap. Well-studied TMDs, such as molybdenum disulfide (MoS2) and tungsten diselenide (WSe2), exhibit a direct bandgap in the monolayer form, but an indirect bandgap in the bulk form. Rhenium disulfide (ReS2), on the other hand, is a new TMD that is unique in its ability to retain a direct bandgap independent of thickness. By using chemical vapor deposition (CVD), few-layer ReS2 is synthesized and characterized by optical methods such as Raman spectroscopy and photoluminescence. We also show characterization results for atomic force microscopy (AFM), x-ray photoelectron spectroscopy (XPS), scanning electron microscope (SEM), transmission electron microscope (TEM), and electrical transport to determine thickness, crystallinity, homogeneity, and electrical characteristics for use in future flexible electronics.
新型TMD:二硫化铼的合成与表征
过渡金属二硫族化合物(TMDs)是一种令人兴奋的新材料,由于其在直接带隙中的半导体特性而受到广泛关注。研究充分的tmd,如二硫化钼(MoS2)和二硒化钨(WSe2),在单层形式下表现出直接带隙,而在块状形式下表现出间接带隙。另一方面,二硫化铼(ReS2)是一种新的TMD,其独特之处在于它能够保持与厚度无关的直接带隙。采用化学气相沉积(CVD)技术合成了少层ReS2,并用拉曼光谱和光致发光等光学方法对其进行了表征。我们还展示了原子力显微镜(AFM), x射线光电子能谱(XPS),扫描电子显微镜(SEM),透射电子显微镜(TEM)和电输运的表征结果,以确定厚度,结晶度,均匀性和电气特性,用于未来的柔性电子产品。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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