Influence of Interfacial Oxide Layers in Hf0.5Zr0.5O2 based ferroelectric capacitors on reliability performance

R. Alcala, F. Mehmood, Pramoda Vishnumurthy, T. Mittmann, T. Mikolajick, U. Schroeder
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引用次数: 3

Abstract

La2O3, and Al2O3, were evaluated in the form of interfacial oxide layers as potential modifications to achieve increased electric field cycling endurance and polarization retention in comparison to the parent stand-alone Hf0.5Zr0.5O2 capacitor structure. Although it was possible to modify the ferroelectric and conductive behavior of the capacitor, the addition of an interfacial oxide layer also introduced parasitic effects which hampered the improvements. This, nevertheless, was material dependent, with La2O3 outperforming Al2O3.
Hf0.5Zr0.5O2基铁电电容器界面氧化层对可靠性性能的影响
La2O3和Al2O3以界面氧化层的形式被评价为潜在的修饰,与母材独立的Hf0.5Zr0.5O2电容器结构相比,可以提高电场循环耐力和极化保持能力。虽然可以修改电容器的铁电和导电性能,但界面氧化层的添加也引入了寄生效应,阻碍了改进。然而,这与材料有关,La2O3优于Al2O3。
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