A multi-factorial approach for middle-of-line design rule validation and optimization in 22FDX®

Abstract

In order to allow competitive and low-cost designs in the 22nm FD-SOI technology 22FDX®, novel Middle-of-Line (MOL) constructs have been specifically enabled. Single­Diffusion Break and Gate Tie-Down constructs and their specific design-to-process validation requirements are described. In particular, contact punch-through is investigated and validated using electrical and E-beam inspection methods. As a second step, the Gate Tie-down is optimized thanks to layout Design of Experiments to provide optimal performance and density once implemented in Standard Cells.