Demonstration of Bias Dependence of Tunnel Magnetoresistance in Co-MgO-Co Magnetic Tunnel Junctions using First Principles Calculations

M. Chakraverty, P. Harisankar
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引用次数: 2

Abstract

This paper reports the bias dependence of tunneling magnetoresistance in Co-MgO-Co magnetic tunnel junctions (MTJs) using first principles SGGA band structure calculations at four different temperatures. The Co-MgO-Co tunnel junction has been simulated at four different temperatures to obtain the I-V and dI/dV-V characteristics with parallel and anti-parallel magnetization states, respectively. The TMR ratios have been computed at all four different temperatures. It is seen that temperature doesn't seem to greatly fluctuate the TMR ratios of this magnetic tunnel junction, thereby making it suitable for applications over a wide range of temperatures. For the same four temperatures, the tunnel junction has been simulated for increasing insulator thicknesses. The exponential increase in resistance in both parallel and antiparallel magnetization states has been observed with an increase in the insulating layer thickness. The effect of increasing insulator thicknesses on the TMR ratios at all the four temperatures has also been presented in this paper. The demonstration of bias dependence of tunneling magnetoresistance presented in this paper aptly justifies the application of Co-MgO-Co MTJs in Magnetoresistive Random Access Memories.
用第一性原理计算证明Co-MgO-Co磁性隧道结中隧道磁电阻的偏置依赖性
本文报道了四种不同温度下Co-MgO-Co磁性隧道结(MTJs)中隧穿磁电阻的偏置依赖性。在4种不同温度下对Co-MgO-Co隧道结进行了模拟,得到了Co-MgO-Co隧道结在平行和反平行磁化状态下的I-V和dI/dV-V特性。在所有四种不同温度下计算了TMR比率。可以看出,温度似乎不会对这种磁隧道结的TMR比率产生很大的波动,从而使其适合在很宽的温度范围内应用。在相同的四种温度下,对增加绝缘子厚度的隧道结进行了模拟。在平行和反平行磁化状态下,电阻随绝缘层厚度的增加呈指数增长。本文还讨论了增加绝缘子厚度对四种温度下TMR比的影响。本文所提出的隧道磁电阻的偏置依赖性证明了Co-MgO-Co MTJs在磁阻随机存取存储器中的应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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