Simulation of electron and ion beam optics for high throughput lithography

Abstract

Several electron and ion beam systems are currently being developed as possible candidates for high-throughput next generation lithography ("NGL"). These include projection electron beam columns such as PREVAIL and SCALPEL ion beam projection systems, multi-beam and multi-column systems. The design and optimization of such systems requires a sophisticated and accurate simulation of the optical performance, including an analysis of the aberrations, Coulomb interaction effects and tolerancing requirements. We have developed a comprehensive range of software tools to assist in this design process.