{"title":"Electron-beam MCM substrate tester","authors":"M. Brunner, R. Schmid","doi":"10.1109/MCMC.1993.302150","DOIUrl":null,"url":null,"abstract":"An electron beam MCM substrate tester that is now installed in a fabrication line is discussed. It provides a spot size of below 25- mu m to probe pads in a 30 cm*30 cm field without mechanical movement. The test speed is 1000 networks in 15 s. The tester is automated for fabrication environment and ease of operation. Several hundred substrates have already been tested on the system while not missing any defect.<<ETX>>","PeriodicalId":143140,"journal":{"name":"Proceedings 1993 IEEE Multi-Chip Module Conference MCMC-93","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-03-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings 1993 IEEE Multi-Chip Module Conference MCMC-93","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MCMC.1993.302150","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
Abstract
An electron beam MCM substrate tester that is now installed in a fabrication line is discussed. It provides a spot size of below 25- mu m to probe pads in a 30 cm*30 cm field without mechanical movement. The test speed is 1000 networks in 15 s. The tester is automated for fabrication environment and ease of operation. Several hundred substrates have already been tested on the system while not missing any defect.<>