CSTBT™(III) having wide SOA under high temperature condition

Y. Fukada, Kenji Suzuki, Tetsuo Takahashi, Tatsuo Harada, Hidenori Fujii, S. Ishizawa, J. Yamashita, J. Donlon, T. Terashima
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引用次数: 3

Abstract

This paper presents high temperature performance of CSTBT™ (III) and its main parameters. The key for high temperature operation is suppressing the parasitic NPN transistor action. N+ emitter width, P+ diffusion layer depth and gate oxide thickness are main parameters for suppressing the parasitic action. The optimized 1200V CSTBT™(III) succeeded in 200°C operation without any thermal runaway or turn-off failure.
CSTBT™(III)在高温条件下具有宽SOA
本文介绍了CSTBT™(III)的高温性能及其主要参数。高温工作的关键是抑制寄生NPN晶体管的作用。N+发射极宽度、P+扩散层深度和栅极氧化层厚度是抑制寄生作用的主要参数。优化后的1200V CSTBT™(III)在200°C下成功工作,没有任何热失控或关断故障。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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