Process performance of the ULVAC IW-630 200/300mm implanter

Abstract

The process performance for ULVAC's IW-630 200/300 mm medium current ion implanter is reviewed. The IW-630 was designed to ensure high beam parallelism, high-energy purity, and low defect contamination through the use of a ground magnet. The analyses presented include beam parallelism, energy purity, particle contamination, metals contamination, dose uniformity and repeatability.