Analysis of Switching Characteristics of Wide SOA and High Reliability 100 V N-LDMOS Transistor with Dual RESURF and Grounded Field Plate Structure

A. Kuwana, Jun-Ichi Matsuda, Haruo Kobayashi
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引用次数: 1

Abstract

We proposed a wide SOA and high reliability 0.35 μm CMOS compatible 100 V dual RESURF LDMOS transistor with low switching loss and low specific on-resistance for automotive applications. This paper describes detailed switching characteristics by changing load resistance RL and gate resistance RG for actual use which were not investigated. TCAD simulations verified that the total energy loss (total switching loss + conduction loss) of the proposed device is sufficiently smaller (about 30 % down at the maximum) than that of the conventional device in most of the actual use range except for the following region: low duty cycle D < 0.1 and high switching frequency f > 1.1 MHz at a low RG of 1.31 Ωmm2 and a high RL of 65.5 Ωmm2 under a device layout area of 1 mm2. Also, a unique switching characteristic of the proposed device, or a convex-shape gate plateau, not observed before, is analyzed.
宽SOA高可靠性100 V N-LDMOS双路复路接地结构晶体管开关特性分析
我们提出了一种宽SOA和高可靠性的0.35 μm CMOS兼容100 V双RESURF LDMOS晶体管,具有低开关损耗和低比导通电阻,用于汽车应用。本文详细描述了实际使用中通过改变负载电阻RL和栅极电阻RG的开关特性。TCAD仿真验证的总能量损失(总开关损耗+传导损失)的设备是足够小(大约在最大30%)比传统的设备在大多数的实际使用范围除了以下地区:低占空比D < 0.1和高开关频率f > 1.1 MHz RG低1.31Ω平方毫米高RL的65.5Ω平方毫米以下的设备布局面积1平方毫米。此外,还分析了所提出器件的独特开关特性,即以前未观察到的凸形栅极平台。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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