Design of metal electrodes with six important electrooptic materials

A. Zaghloul
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引用次数: 1

Abstract

The coplanar electrode is analyzed by using conformal mapping and image methods where the electrode thickness is very thin. Three electrode configurations (symmetric, asymmetric and negative symmetric) are analyzed with six electrooptic materials (ADP, KDP, LiNbO/sub 3/, LiTaO/sub 3/, KNbO/sub 3/ and BaTiO/sub 3/) to find the characteristic impedance, Z, and the electric field components, E/sub x/ and E/sub y/. The dimensions of the electrodes and the thickness of electrooptic material are designed to realize a matching impedance of 50 ohms. The impedance decreases when the relative permittivity, /spl epsiv//sub r/ of the electrooptic material increases but it increases with a buffer layer. There is one or more compatible substrate materials for each electrooptic material. The effect of the shielding electrodes is discussed. The above methods give good accuracy as compared to the finite element method (FEM). The numerical results can be used as guide design curves.
六种重要电光材料的金属电极设计
对共面电极厚度很薄的情况,采用保角映射和成像方法进行了分析。利用ADP、KDP、LiNbO/sub 3/、LiTaO/sub 3/、KNbO/sub 3/和BaTiO/sub 3/等6种电光材料,分析了对称、非对称和负对称三种电极配置,得到了特征阻抗Z和电场分量E/sub x/和E/sub y/。设计了电极尺寸和电光材料厚度,以实现50欧姆的匹配阻抗。当电光材料的相对介电常数/spl epsiv//sub r/增大时,阻抗减小,但随着缓冲层的增加,阻抗增大。每种电光材料都有一种或多种兼容的衬底材料。讨论了屏蔽电极的作用。与有限元法(FEM)相比,上述方法具有良好的精度。数值计算结果可作为指导设计曲线。
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