Topological analysis of stationary behaviour of transferred electron devices with n+-n-n+ structure

H. Tateno, S. Kataoka, K. Tomizawa
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引用次数: 1

Abstract

A theoretical investigation of the stationary behaviour of transferred electron devices with GaAs-type velocity-field characteristics has been carried out on an electron concentration field plane. Solutions over a wide range of doping concentration which satisfy the boundary conditions for n+-n-n+ structure can topologically be obtained using the method of the field of directions which was introduced by Boer and associates. The use of this method enable us not only to understand and predict a variety of device phenomena based on formation of an anode domain, but also to see the concept of instability.
n+-n-n+结构转移电子器件稳态行为的拓扑分析
本文在电子浓度场平面上对具有gaas型速度场特性的转移电子器件的稳态行为进行了理论研究。利用Boer等人提出的方向场方法,可以从拓扑上得到满足n+-n-n+结构边界条件的大掺杂浓度范围内的解。这种方法的使用使我们不仅能够理解和预测基于阳极畴形成的各种器件现象,而且还可以看到不稳定性的概念。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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