Investigation about the high-temperature impact-ionization coefficient in silicon

S. Reggiani, M. Rudan, E. Gnani, G. Baccarani
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引用次数: 17

Abstract

In this work, we address the problem of field- and temperature-dependence of the impact-ionization coefficient in silicon. A careful prediction of the impact-ionization phenomenon is essential for the design of devices working in high-current/voltage conditions, where self heating is relevant. A new model is proposed, fitted on first-principle calculations, that demonstrates the essential role played by the non-equilibrium Auger effect, which is neglected in standard approaches. The model is corroborated by a theoretical analysis, that confirms the numerical findings about the field and temperature dependencies.
硅中高温冲击电离系数的研究
在这项工作中,我们解决了硅中冲击电离系数的场和温度依赖问题。仔细预测冲击电离现象对于设计在高电流/电压条件下工作的器件是必不可少的,其中自加热是相关的。根据第一性原理计算,提出了一个新的模型,证明了非平衡俄歇效应在标准方法中被忽略的重要作用。理论分析证实了模型的正确性,证实了场和温度相关性的数值结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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