The Proliferation of Silicon Germanium

A. Schuppen, M. Tortschanoff, J. Berntgen, P. Maier, D. Zerrweck, H. von der Ropp, J. Tolonics, K. Burger
{"title":"The Proliferation of Silicon Germanium","authors":"A. Schuppen, M. Tortschanoff, J. Berntgen, P. Maier, D. Zerrweck, H. von der Ropp, J. Tolonics, K. Burger","doi":"10.1109/ESSDERC.2000.194723","DOIUrl":null,"url":null,"abstract":"SiGe has already penetrated into the III/V market by rf IC ́s in the 0.9-2.4 GHz range. SiGe technologies have a high reliability, operates also at low voltages and nevertheless it reveals 72% PAE @ GSM frequency, 60% PAE for a 3W DCS power HBT and 50% PAE for CDMA at 1.9GHz. Combined with flip chip technology TEMIC ́s SiGe1 process is well suited for rf power systems up to 6 GHz. For higher frequencies and due to performance pressure of pure Si from the bottom of the frequency scale and III/V devices from the top, the next generation: SiGe2 proliferates into III/V area in the 720 GHz range. SiGe2 technology includes three types of transistors on the same wafer, having 25, 40 and 70 GHz transit frequencies with 7, 4 and 2.5V BVCE0 corresponding breakdown voltages.","PeriodicalId":354721,"journal":{"name":"30th European Solid-State Device Research Conference","volume":"106 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"30th European Solid-State Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSDERC.2000.194723","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

Abstract

SiGe has already penetrated into the III/V market by rf IC ́s in the 0.9-2.4 GHz range. SiGe technologies have a high reliability, operates also at low voltages and nevertheless it reveals 72% PAE @ GSM frequency, 60% PAE for a 3W DCS power HBT and 50% PAE for CDMA at 1.9GHz. Combined with flip chip technology TEMIC ́s SiGe1 process is well suited for rf power systems up to 6 GHz. For higher frequencies and due to performance pressure of pure Si from the bottom of the frequency scale and III/V devices from the top, the next generation: SiGe2 proliferates into III/V area in the 720 GHz range. SiGe2 technology includes three types of transistors on the same wafer, having 25, 40 and 70 GHz transit frequencies with 7, 4 and 2.5V BVCE0 corresponding breakdown voltages.
硅锗的扩散
SiGe已经通过0.9-2.4 GHz范围内的rf IC渗透到III/V市场。SiGe技术具有高可靠性,也可以在低电压下运行,然而它显示了72%的PAE @ GSM频率,60%的PAE用于3W DCS功率HBT, 50%的PAE用于1.9GHz的CDMA。结合倒装芯片技术,TEMIC的SiGe1工艺非常适合高达6 GHz的射频电源系统。对于更高的频率,由于来自频率标度底部的纯Si和来自顶部的III/V器件的性能压力,下一代:SiGe2在720 GHz范围内扩散到III/V区域。SiGe2技术包括同一晶圆上的三种类型的晶体管,具有25、40和70 GHz的传输频率,对应的击穿电压为7、4和2.5V BVCE0。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信