Analysis and Modeling of Subthreshold Leakage of RT-Components under PTV and State Variation

Abstract

In this work we present a SPICE-based RTL subthreshold leakage model analyzing components built in 70nm technology. We present a separation approach regarding inter- and intra-die threshold variations, temperature, supply-voltage, and state dependence. The body-effect and differences between NMOS and PMOS introduce a leakage state dependence of one order of magnitude (Mukhopadhyay, 2003). We show that the leakage of RT-components still shows state dependencies between 20% and 80%. A leakage model not regarding the state can never be more accurate than this. The proposed state aware model has an average error of 6.7% for the RT-components analyzed