Initial Experiments on Direct Aerial Image Measurements in the Extreme Ultraviolet

Abstract

We report the current status of research to apply the technique of direct aerial image monitoring (AIM) to measure the performance of an Extreme Ultraviolet Lithography (EUVL) test bed. There are several issues which might limit the possibility of performing image monitoring experiments on EUVL systems. These issues include: Source flux, signal to noise ratios, and EUV scanning aperture fabrication.