Annealing time dependence of zinc oxide thin films memristive behavior

N. Shaari, Shafaq Mardhiyana Mohd Kasim, Nur Sa'adah Muhamad Sauki, S. H. Herman
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Abstract

This work focused on the memristive behavior of zinc oxide (ZnO) thin films. ZnO thin films were prepared by sol-gel spin coating technique on the ITO substrate. The deposited thin films were annealed at 300°C in a furnace with variation of annealing time of 30, 60 and 120 minutes. The electrical properties were characterized to obtain the pinched hysteresis loop graph to calculate its Roff/Ron ratio. The sample annealed for 60 minutes has the best switching behavior with highest Roff/Ron ratio of 1.744. The sample also exists in amorphous form as characterized by the X-ray diffraction spectra measurement.
氧化锌薄膜忆阻行为的退火时间依赖性
本文主要研究氧化锌(ZnO)薄膜的忆阻行为。采用溶胶-凝胶自旋镀膜技术在ITO衬底上制备了ZnO薄膜。将沉积的薄膜在300℃的炉内退火,退火时间分别为30、60和120分钟。对其电学特性进行表征,得到缩紧磁滞回线图,计算其Roff/Ron比。退火60分钟的样品开关性能最好,Roff/Ron比最高,为1.744。经x射线衍射光谱测定,样品以无定形存在。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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