Electrical and optical properties of the WOx thin films, prepared by magnetron sputtering, and analysis of their highest value

Julia Dybała, M. Mazur
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Abstract

In this article, optical and electrical properties of tungsten oxide thin films, prepared by magnetron sputtering in the atmosphere of various oxygen content, were analysed. Tungsten oxide is a material, which is widely used in modern applications such as smart windows, anti-steam mirrors, and gas sensors. Five sets of tungsten oxide thin films were deposited by magnetron sputtering in the mixed argon-oxygen atmosphere composed of various content of reactive gas, i.e., from 5% to 15%. In each case, other deposition process parameters were the same. The thickness of the thin films was ca. 160 nm and it was measured with the optical profilometer. It was noticed that along with the increase in the proportion of reactive gas in the process, thin film samples changed their colour from metallic, through navy blue to blue and simultaneously they became increasingly transparent. Measurements of electrical properties, made using the four-point probe and optical properties, performed with the aid of a spectrophotometer showed that increasing the proportion of oxygen in the process increased the average transmission in the visible wavelength range and the resistivity of the prepared WOx thin films. In the article, the Figure of Merit (FoM) coefficients are also presented, which determine the quality of the thin film samples. It was shown that the highest value of the FoM was observed for WOx thin film characterised by a relatively high average transmission in the visible wavelength range and low value of resistivity. The performed measurements showed that the gas atmosphere during magnetron sputtering process leads to the tailoring of the optical and electrical properties of tungsten oxide thin films, which in turn makes it possible to design and apply such thin film coatings in transparent electronics. Keywords: magnetron sputtering, thin films, tungsten oxide, optical and electrical properties
磁控溅射制备的WOx薄膜的电学和光学特性及其最高值分析
本文分析了磁控溅射法制备的氧化钨薄膜在不同氧含量气氛下的光学和电学性能。氧化钨是一种材料,广泛应用于智能窗户、防蒸汽镜、气体传感器等现代应用中。采用磁控溅射法制备了5组氧化钨薄膜,制备的氧化钨薄膜由不同含量的反应气体(5% ~ 15%)组成。在每种情况下,其他沉积工艺参数相同。薄膜的厚度约为160 nm,用光学轮廓仪测量。人们注意到,随着过程中活性气体比例的增加,薄膜样品的颜色从金属色变为深蓝色到蓝色,同时它们变得越来越透明。利用四点探针和分光光度计对WOx薄膜的电学性能和光学性能进行了测量,结果表明,在制备过程中增加氧的比例增加了WOx薄膜在可见波长范围内的平均透射率和电阻率。本文还给出了决定薄膜样品质量的FoM系数。结果表明,在可见光范围内平均透射率较高、电阻率较低的WOx薄膜中,FoM值最高。测量结果表明,磁控溅射过程中的气体气氛导致氧化钨薄膜的光学和电学特性的定制,从而使得设计和应用这种薄膜涂层在透明电子产品中成为可能。关键词:磁控溅射,薄膜,氧化钨,光电性能
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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