Electrochemical process of n-Si photonic structure formation

Abstract

Electrochemical process of the n-Si macroporous photonic structure formation has been investigated. The stationary distribution of the nonequilibrium hole concentration through the depth of n-Si plates after the intrinsic backside illumination was calculated. The light intensity and the electrical field regimes were determined for the macropore formation with the constant hole concentration on the tips. The stationary current regime is not equal to the electrochemical process stability. It was found that the stabilization of the hole concentration due to the light intensity change is more effective relatively the electrical field variation. The hole concentration stability and the cylindrical pore formation are possible for the high photosensitive samples only.