KrF laser surface treatment of CNT cathodes

T. Honda, W. Rochanachirapar, K. Murakami, K. Ohsumi, N. Shimizu, S. Abo, F. Wakaya, M. Takai
{"title":"KrF laser surface treatment of CNT cathodes","authors":"T. Honda, W. Rochanachirapar, K. Murakami, K. Ohsumi, N. Shimizu, S. Abo, F. Wakaya, M. Takai","doi":"10.1109/IVNC.2005.1619605","DOIUrl":null,"url":null,"abstract":"Carbon nanotube (CNT) cathodes prepared with various pastes are irradiated by KrF laser light with different power densities and homogenous spot beam. The turn-on field is lowest with the homogeneous spot beam. The characteristics are improved greatly by adding glass fillers to the paste. The turn-on field is as low as 0.34 V//spl mu/m and the emission density is as high as 5.88 mA/cm/sup 2/ at a field of 2 V//spl mu/m by KrF laser irradiation. Homogeneous emission-site distribution could be obtained by a homogeneous laser beam irradiation.","PeriodicalId":121164,"journal":{"name":"2005 International Vacuum Nanoelectronics Conference","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 International Vacuum Nanoelectronics Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVNC.2005.1619605","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Carbon nanotube (CNT) cathodes prepared with various pastes are irradiated by KrF laser light with different power densities and homogenous spot beam. The turn-on field is lowest with the homogeneous spot beam. The characteristics are improved greatly by adding glass fillers to the paste. The turn-on field is as low as 0.34 V//spl mu/m and the emission density is as high as 5.88 mA/cm/sup 2/ at a field of 2 V//spl mu/m by KrF laser irradiation. Homogeneous emission-site distribution could be obtained by a homogeneous laser beam irradiation.
碳纳米管阴极的KrF激光表面处理
用不同功率密度、均匀光斑光束的KrF激光照射不同浆料制备的碳纳米管阴极。均匀光斑光束的导通场最小。在浆料中加入玻璃填料,使浆料的性能得到很大改善。在2 V//spl mu/m场下,KrF激光的导通场低至0.34 V//spl mu/m,发射密度高达5.88 mA/cm/sup 2/。采用均匀激光束照射可获得均匀的发射场分布。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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