U-MRAM: Transistor-Less, High-Speed (10 ns), Low-Voltage (0.6 V), Field-Free Unipolar MRAM for High-Density Data Memory

Ming-Hung Wu, Ming-Chun Hong, Ching-Kuei Shih, Yao-Jen Chang, Y. Hsin, Shih-Ching Chiu, Kuan-Ming Chen, Yi-Hui Su, Chih-Yao Wang, Shan-Yi Yang, Guan-Long Chen, Hsin-Han Lee, S. Z. Rahaman, I. Wang, Chen-Yi Shih, Tsun-Chun Chang, Jeng-Hua Wei, S. Sheu, W. Lo, Shih-Chieh Chang, T. Hou
{"title":"U-MRAM: Transistor-Less, High-Speed (10 ns), Low-Voltage (0.6 V), Field-Free Unipolar MRAM for High-Density Data Memory","authors":"Ming-Hung Wu, Ming-Chun Hong, Ching-Kuei Shih, Yao-Jen Chang, Y. Hsin, Shih-Ching Chiu, Kuan-Ming Chen, Yi-Hui Su, Chih-Yao Wang, Shan-Yi Yang, Guan-Long Chen, Hsin-Han Lee, S. Z. Rahaman, I. Wang, Chen-Yi Shih, Tsun-Chun Chang, Jeng-Hua Wei, S. Sheu, W. Lo, Shih-Chieh Chang, T. Hou","doi":"10.23919/VLSITechnologyandCir57934.2023.10185336","DOIUrl":null,"url":null,"abstract":"U-MRAM, an enabler of a diode-selected cross-point MRAM array, is demonstrated using a mature device structure identical to STT-MRAM. U-MRAM exploits the probabilistic switching of thermal fluctuations using a single write voltage. The asymmetric synthetic antiferromagnetic layer (SAF) enables promising UMRAM properties, including low voltage (0.6 V), high speed (10 ns), excellent endurance (>$10^{10})$, and long retention (>10 years) without an external magnetic field. Diode-selected U-MRAM is a strong candidate for future high-density embedded memory.","PeriodicalId":317958,"journal":{"name":"2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185336","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

U-MRAM, an enabler of a diode-selected cross-point MRAM array, is demonstrated using a mature device structure identical to STT-MRAM. U-MRAM exploits the probabilistic switching of thermal fluctuations using a single write voltage. The asymmetric synthetic antiferromagnetic layer (SAF) enables promising UMRAM properties, including low voltage (0.6 V), high speed (10 ns), excellent endurance (>$10^{10})$, and long retention (>10 years) without an external magnetic field. Diode-selected U-MRAM is a strong candidate for future high-density embedded memory.
U-MRAM:无晶体管,高速(10ns),低电压(0.6 V),用于高密度数据存储器的无场单极MRAM
U-MRAM是二极管选择交叉点MRAM阵列的实现器,使用与STT-MRAM相同的成熟器件结构进行演示。U-MRAM利用单个写入电压利用热波动的概率开关。非对称合成反铁磁层(SAF)使UMRAM具有良好的性能,包括低电压(0.6 V),高速(10 ns),优异的耐用性(>10 ^{10})和长保留时间(>10年),而无需外部磁场。二极管选择的U-MRAM是未来高密度嵌入式存储器的有力候选。
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