A method of incorporating wet-oxidized III-V semiconductor layers into indium phosphide based lasers and amplifiers

Abstract

We have demonstrated a method of efficient wet oxidation for use in device fabrication using material system lattice-matched to indium phosphide. It was found that the oxidation of a strain compensated InAs/AlAs super-lattice grown on InP proceeded much faster than lattice matched InAlAs. This method has been used for current confinement in InP based edge emitting stripe lasers. The same wet oxidation process is also well suited for long wavelength VCSEL application.