Ge-on-Si pin-photodiodes for vertical and in-plane detection of 1300 to 1580 nm light

M. Jutzi, M. Berroth, G. Wohl, M. Oehme, V. Stefani, E. Kasper
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引用次数: 2

Abstract

Ge-on-Si pin-photodiodes for vertical and in-plane detection are presented. The devices are grown on an 31 nm ultrathin, strain relaxed buffer (SRB) layer. The vertical photodiode exhibits a zero-bias responsivity of 117 mA/W and a bandwidth of 1.5 GHz at a wavelength of 1298 nm. In comparison, the detector for in-plane detection has a zero-bias responsivity of 70 mA/W and a bandwidth of 4.4 GHz. For a bias voltage of -2 V a bandwidth of 6.2 GHz has been measured. At 1580 nm the photo responsivity of the lateral photodiode is higher (26 mA/W) than of the vertical photodiode (19 mA/W). The dislocation density probably may limit the bandwidth.
Ge-on-Si针脚光电二极管用于1300至1580 nm光的垂直和面内检测
提出了用于垂直和平面内检测的Ge-on-Si针脚光电二极管。这些器件生长在31 nm的超薄应变松弛缓冲层(SRB)上。垂直光电二极管在1298 nm波长处的零偏响应率为117 mA/W,带宽为1.5 GHz。相比之下,平面内检测检测器的零偏响应率为70 mA/W,带宽为4.4 GHz。当偏置电压为-2 V时,测量到的带宽为6.2 GHz。在1580 nm处,横向光电二极管的光响应率(26 mA/W)高于垂直光电二极管(19 mA/W)。位错密度可能会限制带宽。
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