{"title":"Micro-bias-tees using micromachined flip-chip inductors","authors":"P. Bell, V. Bright, Z. Popovic","doi":"10.1109/MWSYM.2003.1210983","DOIUrl":null,"url":null,"abstract":"In order to reduce the circuit area required by bias-tees in active circuits, an approach using a micromachined suspended inductor is presented in this paper. The inductor is fabricated using a commercial silicon micromachining process and then integrated with a microwave circuit using flip-chip assembly. Suspending the inductor above the substrate greatly reduces the parasitic capacitances associated with the substrate. The inductor has a measured self-resonant frequency of 18 GHz. A tethered approach allows \"pre-releasing\" of the structure, which makes integration possible on any substrate. 4-mm/sup 2/ bias-tees on both alumina and TMM6 substrates are presented in this work with comparable performance to commercially available bias-tees, but with a significant reduction in circuit area.","PeriodicalId":252251,"journal":{"name":"IEEE MTT-S International Microwave Symposium Digest, 2003","volume":"19 12","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"13","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE MTT-S International Microwave Symposium Digest, 2003","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MWSYM.2003.1210983","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 13
Abstract
In order to reduce the circuit area required by bias-tees in active circuits, an approach using a micromachined suspended inductor is presented in this paper. The inductor is fabricated using a commercial silicon micromachining process and then integrated with a microwave circuit using flip-chip assembly. Suspending the inductor above the substrate greatly reduces the parasitic capacitances associated with the substrate. The inductor has a measured self-resonant frequency of 18 GHz. A tethered approach allows "pre-releasing" of the structure, which makes integration possible on any substrate. 4-mm/sup 2/ bias-tees on both alumina and TMM6 substrates are presented in this work with comparable performance to commercially available bias-tees, but with a significant reduction in circuit area.