{"title":"SIDS - A Symbolic Interactive Design System","authors":"D. Clary, R. Kirk, S. Sapiro","doi":"10.1145/800139.804542","DOIUrl":null,"url":null,"abstract":"A new production approach to IC mask layout/checking is described which makes use of a combination of symbolic layout, computer checking and color graphics to resolve some of the problems in currently available layout systems. Techniques such as on-line design rule and connectivity checking, not found in other production systems, give the user \"instant\" feedback as he is designing.","PeriodicalId":196513,"journal":{"name":"17th Design Automation Conference","volume":"3 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1980-06-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"17th Design Automation Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1145/800139.804542","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
A new production approach to IC mask layout/checking is described which makes use of a combination of symbolic layout, computer checking and color graphics to resolve some of the problems in currently available layout systems. Techniques such as on-line design rule and connectivity checking, not found in other production systems, give the user "instant" feedback as he is designing.