Application specific devices: transport and performance of the Quasi-MODFET and the graded base heterojunction bipolar transistor

A. Iliadis, J. Zahurak, S. Tabatabaei
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引用次数: 1

Abstract

Two application-specific devices, a novel doped-channel Quasi-MODFET on AlInAs/InGaAs/InP, and an AlGaAs/GaAs graded-base heterojunction bipolar transistor, suitable for high current/gain applications in energy efficient mobile communication and optical communication and computer networks, have been developed. The study of transport and performance of the doped-channel MODFETs included the quantum well, channel width, doping profile, and composition, and revealed that the position of the electron wavefunction peak can be engineered to shift in areas of minimum scattering, which resulted in the development of the 0.5 /spl mu/m Q-MODFET with a g/sub m/=703 mS/mm and I/sub dent/=800 to 940 mA/mm at V/sub g/=0 to 0.4 V, the highest g/sub m/ recorded for a doped-channel device. In the HBT, the development of a rigorous two-dimensional model providing the optimum compositional grading of the base, the improvement of the collector using thinner layers and higher doping, and the emitter using compositional grading, resulted in the development of a high current heterojunction bipolar transistor appropriate for laser drivers.
特定应用器件:准modfet和梯度基极异质结双极晶体管的传输和性能
开发了两种适用于高能效移动通信、光通信和计算机网络的高电流/增益器件,分别是基于AlInAs/InGaAs/InP的新型掺杂通道准modfet和AlGaAs/GaAs渐变基异质结双极晶体管。通过对掺杂沟道modfet的量子阱、沟道宽度、掺杂谱和成分的研究,发现电子波函数峰的位置可以在散射最小的区域移动,从而开发出0.5 /spl mu/m的Q-MODFET,在V/sub g/=0 ~ 0.4 V时,g/sub m/=703 mS/mm, I/sub dent/=800 ~ 940 mA/mm,这是掺杂沟道器件记录到的最高g/sub m/。在HBT中,严格的二维模型的发展提供了最佳的基极成分分级,集电极使用更薄的层和更高的掺杂进行改进,发射极使用成分分级,导致了适合激光驱动器的高电流异质结双极晶体管的发展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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